Contact

Email :

Centre de Strasbourg
2 allée des Foulons
67380 Lingolsheim

Research team

Engineering and Numerical Tools

Research themes

  • Materials and processes: micro/nano-technology, additive manufacturing, surface treatments, nanomaterials, composites, glasses, metallic materials.
  • Future industry.

Educational activities

  • Teaching physics, engineering and materials sciences.
  • Teaching with traditional and active methods.
  • Supervising and monitoring of integrated preparatory cycle.
  • Instructor in active learning.

Background

  • PhD
    Grenoble INP , 2007
    Energy Physics, Materials option
  • Master degree
    Grenoble INP , 2003
    Energy Physics, Materials option

Supervision and scientific animation

  • Supervision of trainees: Master, Bachelor, BUT 2nd year, engineering cycle (2nd year)
    Reviewer in Surface and Coatings Technology journal

Publications

  • Synthesis (7 years of activity)
    8 journal papers
    1 conference paper
    9 oral communications
    4 posters

Selected publications

  • A. Hodroj et al.- Nanocrystalline diamond coatings: Effects of time modulation bias enhanced HFCVD parameters.- AIMS Materials Science, vol. 5, n°3, 2018, pp. 519-532. doi: 10.3934/matersci.2018.3.519
    S. Kassavetis, A. Hodroj et al.- Optical and electronic properties of conductive ternary nitrides with rare or alkaline earth elements.- Journal of Applied Physics, vol. 120, n°22, 2016, pp. 225106(1)- 225106(10). https://doi.org/10.1063/1.4971407
    A. Hodroj et al.- Phase separation and special morphology in sodium silicate glasses analyzed by atomic force microscopy, light scattering and nuclear magnetic resonance.- Journal of the American Ceramic Society, vol. 96, n°8, 2013, pp.2454- 2460. https://doi.org/10.1111/jace.12459
    A. Hodroj et al.- Development of novel titanium nitride-based decorative coatings by calcium addition.- Applied Surface Science, vol. 257, n°20, 2011, pp. 8525-8528. https://doi.org/10.1016/j.apsusc.2011.04.144
    A. Hodroj et al. – Growth of amorphous Ti-Si-O thin films by aerosol chemical vapor deposition process at atmospheric pressure.- Journal of the Electrochemical Society, vol. 155, n° 2, 2008, pp.D110-114. https://iopscience.iop.org/article/10.1149/1.2806790